Title :

High Resolution Surface Nanopatterning and some Potential Applications

Speaker :

Prof. Jens Gobrecht

Laboratory for Micro- and Nanotechnology

Paul Scherrer Institute,Villigen-PSI, Switzerland

Venue :

Room 215, William M. W. Mong Engineering Building, CUHK

Date :

Apr 5, 2013, Friday
2:00 PM - 3:00 PM

Abstract :

In this talk the technological possibilities for controlled surface nano-patterning developed at the “Laboratory for Micro- and Nanotechnology” (LMN) will be reviewed. These are high resolution electron beam lithography and a new approach of soft X-ray lithography, so called Extreme UV interference lithography (EUV-IL). In this technique, two coherent beams from a synchrotron light source create periodic interference patterns in a photoresist layer. Using 13.6 nm radiation we presently achieve line or dot gratings with feature sizes down to 7nm which is close to the theoretical limit. The patterns can be printed in one shot over fairly large areas (~mm2).

Some applications of these high resolution patterning techniques will be presented. These can be e.g. focusing X-ray optical devices or plasmonic structures. An outlook will be given on other potential applications.

Biography :

Prof. Jens Gobrecht studied physics at the Technical University of Berlin and received his diploma in engineering in 1976. His PhD project on liquid junction solar cells was carried out at the Fritz-Haber Institute of the Max-Planck Society in Berlin. In 1980/81, he worked on a post-doc position at the National Renewable Energy Laboratory in Golden, USA. After that he worked for 12 years in various functions at the ABB Corporate Research Center in Baden, Switzerland. In 1993, he joined the Paul Scherrer Institute (PSI) and built up the newly founded Laboratory for Micro- and Nanotechnology. In 2005 he was appointed Professor at the University of Applied Sciences of Northwestern Switzerland and head of the new Institute of Polymer Nanotechnology, a joint venture with PSI. In 2007, J. Gobrecht co-founded “Eulitha AG”, a company active in EUV-based nanolithography.

    **************************************** ALL ARE WELCOME ****************************************

Enquiries: Ms. Flora Au-Yeung, Department of Mechanical and Automation Engineering, CUHK at 3943 7026. *MAE Series (2012-13) is contained in the World-Wide Web home page at http://www3.mae.cuhk.edu.hk/mae_seminars.php.